Multistep virtual metrology approaches for semiconductor manufacturing processes

IEEE International Conference on Automation Science and Engineering

Volumn , Issue , 2012, Pages 91-96

  Pampuri, Simone ^a   Schirru, Andrea ^a   Susto, Gian Antonio ^b   De Luca, Cristina ^c   Beghi, Alessandro ^b   De Nicolao, Giuseppe ^a  

^a UNIVERSITY OF PAVIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c INFINEON TECHNOLOGIES AUSTRIA AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CONTEXT INFORMATION; COST-INTENSIVE; DATA SETS; ELECTRICAL TESTS; FEEDBACK CONTROL LOOPS; HIGH-DIMENSIONAL; INPUT SPACE; LAYER THICKNESS; MULTI-STEP; ON-PRODUCT MONITORING; PROCESS DATA; PROCESS STEPS; PROCESS TIME; PRODUCTION PROCESS; QUALITY FEATURES; REGRESSION TECHNIQUES; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR MANUFACTURING INDUSTRY; SEMICONDUCTOR MANUFACTURING PROCESS; SEQUENTIAL OPERATIONS; STATE OF THE ART; STATISTICAL MODELS; VIRTUAL METROLOGY;

EMBEDDED SYSTEMS; PRODUCTION ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE; SUSTAINABLE DEVELOPMENT; UNITS OF MEASUREMENT;

MEASUREMENTS;

EID: 84872530718     PISSN: 21618070     EISSN: 21618089     Source Type: Conference Proceeding    
DOI: 10.1109/CoASE.2012.6386484     Document Type: Conference Paper

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