A new perfluoropolyether-based hydrophobic and chemically resistant photoresist structured by two-photon polymerization

Langmuir

Volumn 29, Issue 1, 2013, Pages 426-431

  De Marco, Carmela ^a   Gaidukeviciute, Arune ^b   Kiyan, Roman ^b   Eaton, Shane M ^c   Levi, Marinella ^a   Osellame, Roberto ^c   Chichkov, Boris N ^b   Turri, Stefano ^a  

^a POLITECNICO DI MILANO   (Italy)

^b LASER ZENTRUM HANNOVER E V   (Germany)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

3D STRUCTURE; ARBITRARY GEOMETRY; EXPERIMENTAL CONDITIONS; SUBMICROMETER RESOLUTION; SUBMICROMETERS; THREE DIMENSIONAL (3D) STRUCTURES; TWO PHOTON POLYMERIZATION; WOODPILE STRUCTURE;

PHOTONS; PHOTORESISTS; POLYMERIZATION; THREE DIMENSIONAL COMPUTER GRAPHICS;

HYDROPHOBICITY;

EID: 84872108155     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la303799u     Document Type: Article

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