Acrylic-based resin with favorable properties for three-dimensional two-photon polymerization

Journal of Applied Physics

Volumn 95, Issue 11 I, 2004, Pages 6072-6076

  Baldacchini, Tommaso ^a   LaFratta, Christopher N ^a   Farrer, Richard A ^a   Teich, Malvin C ^b   Saleh, Bahaa E A ^b   Naughton, Michael J ^a   Fourkas, John T ^a  

^a BOSTON COLLEGE   (United States)

^b Boston University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTIONS; MULTIPHOTON ABSORPTION; MULTIPHOTON POLYMERIZATION (MPP); POLYMERIZATION CHAIN-REACTIONS;

ABSORPTION; ACRYLICS; CHARACTERIZATION; ELASTIC MODULI; FABRICATION; FREE RADICALS; MONOMERS; PHOTONS; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; SHRINKAGE;

RESINS;

EID: 2942661974     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1728296     Document Type: Article

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