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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

(6) Mannie, Gilbère J A a,b Gerritsen, Gijsbert c Abbenhuis, Hendrikus C L c Van Deelen, Joop d Niemantsverdriet, J W b Thüne, Peter C b

a MATERIALS INNOVATION INSTITUTE M2I (Netherlands)

b EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

c Hybrid Catalysis BV (Netherlands)

d TNO (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACID BASE; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; BOND SPLITTING; CHEMICAL VAPOR DEPOSITION PROCESS; COORDINATION CHEMISTRY; GAS-PHASE RADICALS; GROWTH MECHANISMS; HYDROLYSIS REACTION; NUCLEATION BEHAVIOR; REACTION MECHANISM; TRANSMISSION ELECTRON MICROSCOPY TEM; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CHLORINE; COORDINATION REACTIONS; FILM GROWTH; FILM PREPARATION; MULTILAYERS; NUCLEATION; PHOTOELECTRONS; TIN; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

EXPERIMENTS;

EID: 84871906418 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4756898 Document Type: Article

Times cited : (7)

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