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Volumn 366, Issue 3, 1996, Pages 545-555
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Interface effects for metal oxide thin films deposited on another metal oxide II. SnO2 deposited on SiO2
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Author keywords
Catalysis; Crystalline glass interfaces; Dielectric phenomena; Electron energy loss spectroscopy; Low energy ion scattering (LEIS); Semiconductor insulator interfaces; Semiconductor metal oxide thin film structures; Silicon oxides
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Indexed keywords
CATALYSIS;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ENERGY GAP;
INTERFACES (MATERIALS);
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTING TIN COMPOUNDS;
SILICA;
SURFACE PHENOMENA;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CRYSTALLINE GLASS INTERFACES;
DIELECTRIC PHENOMENA;
LOW ENERGY ION SCATTERING;
TIN OXIDES;
SEMICONDUCTING FILMS;
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EID: 0030283174
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00831-X Document Type: Article |
Times cited : (92)
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References (29)
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