메뉴 건너뛰기




Volumn 366, Issue 3, 1996, Pages 545-555

Interface effects for metal oxide thin films deposited on another metal oxide II. SnO2 deposited on SiO2

Author keywords

Catalysis; Crystalline glass interfaces; Dielectric phenomena; Electron energy loss spectroscopy; Low energy ion scattering (LEIS); Semiconductor insulator interfaces; Semiconductor metal oxide thin film structures; Silicon oxides

Indexed keywords

CATALYSIS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY GAP; INTERFACES (MATERIALS); SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING TIN COMPOUNDS; SILICA; SURFACE PHENOMENA; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030283174     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00831-X     Document Type: Article
Times cited : (92)

References (29)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.