Stagnation flow reactor investigation of tin oxide CVD from monobutyltin trichloride

Journal of the Electrochemical Society

Volumn 151, Issue 8, 2004, Pages

  Chae, Yongkee ^a   Houf, William G ^a   McDaniel, Anthony H ^a   Troup, Jill ^b   Allendorf, Mark D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b PPG INDUSTRIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS PHASE CHEMISTRY; HETEROGENEOUS CHEMISTRY; PRECUSOR MIXTURE; WATER VAPOR CONCENTRATION;

CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); DECOMPOSITION; DENSITY OF GASES; FILM GROWTH; HYDROLYSIS; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE PHENOMENA; THERMODYNAMICS; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTROCHEMISTRY;

EID: 4344594317     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1760993     Document Type: Article

References (26)

1. R. N. Ghoshtagore, J. Electrochem. Soc., 125, 110 (1978).
2. C. I. Giunta, D. A. Strickler, and R. O. Gordon, J. Phys. Chem., 97, 2275 (1993).
3. Y. P. Yadava, G. Denicolo, A. C. Arias, L. S. Roman, and I. A. Hummelgen, Mater. Chem. Phys., 48, 263 (1997).
4. J. L. Buchanan and C. McKown, J. Non-Cryst. Solids, 218, 179 (1997).
5. R. Gordon, J. Non-Cryst. Solids, 281, 81 (1997).
6. R. J. McCurdy, Thin Solid Films, 351, 66 (1999).
7. S.-M. Lee, D.-L. Kim, H.-J. Youn, and K. S. Hong, Jpn. J. Appl. Phys., Part 1, 39, 407 (2000).
8. M. D. Allendorf, I. M. B. Nielsen, C. F. Melius, and A. M. B. van Mol, in Chemical Vapor Deposition (CVD XVI) and EUROCVD-14, M. D. Allendorf, F. Maury, and F. Teyssandier, Editors, PV 2003-8, p. 55, The Electrochemical Society Proceedings Series, Pennington, NJ (2003).
9. M. D. Allendorf and A. M. B. van Mol, Topics Organomet, Chem., Submitted.
10. A. M. B. van Mol and M. D. Allendorf, in Chemical Vapor Deposition (CVD XVI) and EUROCVD-14, M. D. Allendorf, F. Maury, and F. Teyssandier, Editors, PV 2003-08, p. 65, The Electrochemical Society Proceedings Series, Pennington, NJ (2003).
11. C. G. Borman and R. G. Gordon, J. Electrochem. Soc., 136, 3820 (1989).
12. A. G. Zawadzki, C. J. Giuna, and R. O. Gordon, J. Phys. Chem., 96, 5364 (1992).
13. A. B. Tripathi, D. A. Boyd, H. A. Gallivan, H. A. Atwater, R. M. Murray, D. G. Goodwin, L. R. Raja, R. J. Kee, and J. Musolf, in Chemical Vapor Deposition (CVD XV), M. D. Allendorf and M. L. Hitchman, Editors, PV 2000-13, p. 240, The Electrochemical Society Proceedings Series, Pennington, NJ (2000).
14. M. E. Coltrin, R. J. Kee, and G. H. Evans, J. Electrochem. Soc., 136, 819 (1989).
15. W. G. Breiland and G. H. Evans, J. Electrochem. Soc., 138, 1806 (1991).
16. A. Moller, R. Kall, V. Till, G. Wortberg, and G. Adomeit, J. Cryst. Growth, 174, 837 (1997).
17. M. E. Coltrin, R. J. Kee, G. H. Evans, E. Meeks, F. M. Rupley, and J. F. Grcar, Sandia National Laboratories Report SAND91-8003 (1991).
18. A. B. Tripathi, Ph.D. Thesis, California Institute of Technology, Pasadena, CA (2001).
19. J. Szanyi, Appl. Surf. Sci., 185, 161 (2002).
20. W. S. Winters, G. H. Evans, and C. D. Moen, Sandia National Laboratories Report, SAND97-8202 (1997).
21. S. V. Patankar, Numerical Heat Transfer and Fluid Flow, McGraw-Hill, New York (1980).
22. C. Houtman, D. B. Graves, and K. F. Jensen, J. Electrochem. Soc., 133, 961 (1986).
23. G. Gaggiotti, A. Galdikas, S. Kaciulis, G. Mattogno, and A. Setkus, J. Appl. Phys., 76, 4467 (1994).
24. P. G. Harrison, A. Ashworth, E. N. Clark, and J. McManus, J. Chem. Soc., Faraday Trans., 86, 4059 (1990).
25. D. S. Vlachos, P. D. Skafidas, and J. N. Avaritsiotis, Sens. Actuators B, 25, 491 (1995).
26. R. Matero, A. Rahtu, M. Ritala, M. Leskela, and T. Sajavaara, Thin Solid Films, 368, 1 (2000).