Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2010, Pages

  Chang, Li Wen ^a   Bao, Xinyu ^a   Bencher, Chris ^b   Wong, H S Philip ^a  

^a Stanford University   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; CIRCUIT LAYOUTS; CONTACT HOLES; DIRECTED SELF-ASSEMBLY; EXTERNAL CONFINEMENT; OPTICAL LITHOGRAPHY; SELF ADJUST; SELF-ASSEMBLED; SELF-ASSEMBLING BLOCK COPOLYMERS;

BLOCK COPOLYMERS; COPOLYMERIZATION; ELECTRON DEVICES; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SWITCHING CIRCUITS;

LOGIC CIRCUITS;

EID: 79951846246     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2010.5703468     Document Type: Conference Paper

References (8)

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