Microplasma illumination enhancement of vertically aligned conducting ultrananocrystalline diamond nanorods

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages 1-6

  Sankaran, Kamatchi Jothiramalingam ^a   Kunuku, Srinivasu ^a   Lou, Shiu Cheng ^b   Kurian, Joji ^c   Chen, Huang Chin ^c   Lee, Chi Young ^a   Tai, Nyan Hwa ^a   Leou, Keh Chyang ^a   Chen, Chulung ^b   Lin, I Nan ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b YUAN ZE UNIVERSITY   (Taiwan)

^c TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Electron field emission properties; Microplasma; Reactive ion etching; Ultrananocrystalline diamond nanorods

Indexed keywords

ASPECT RATIO; FIELD EMISSION CATHODES; METAMATERIALS; NANODIAMONDS; PLASMA DEVICES; REACTIVE ION ETCHING;

DISPLAY TECHNOLOGIES; ELECTRON FIELD EMISSION PROPERTIES; HIGH ELECTRICAL CONDUCTIVITY; MICRO-PLASMAS; NANO-DIAMOND PARTICLES; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMONDS; VERTICALLY ALIGNED;

NANORODS;

EID: 84871015884     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-522     Document Type: Article

References (38)

1. Eden JG, Park SJ, Ostrom NP, McCain ST, Wagner CJ, Vojak BA, Chen J, Liu C, von Allmen P, Zenhausern F, Sadler DJ, Jensen C, Wilcox DL, Ewing JJ: Microplasma devices fabricated in silicon, ceramic, and metal/polymer structures: arrays, emitters and photodetectors. J Phys D: Appl Phys 2003, 36:2869-2877.
2. Park SJ, Chen J, Wagner CJ, Ostrom NP, Liu C, Eden JG: Microdischarge arrays: a new family of photonic devices. IEEE J Sel Top: Quantum Electron 2002, 8:387-394.
3. Eden JG, Park SJ, Ostrom NP, Chen KF: Recent advances in microcavity plasma devices and arrays: a versatile photonic platform. J Phys D: Appl Phys 2005, 38:1644-1648.
4. Becker KH, Schoenbach KH, Eden JG: Microplasmas and applications. J Phys D: Appl Phys 2006, 39:R55-R70.
5. Meng LG, Liu CL, Liang HF, Liang ZH: Microplasma array devices with coplanar electrodes operating in neon. Phys. Lett. A 2008, 372:6504-6508.
6. 3/TiN coatings on aluminum alloys for tribological applications using a combined microplasma oxidation (MPO) and arc ion plating (AIP). Wear 2006, 260:215-222.
7. Yang ZS, Shirai H, Kobayashi T, Hasegawa Y: Synthesis of Si nanocones using rf microplasma at atmospheric pressure. Thin Solid Films 2007, 515:4153-4258.
8. Kanazawa S, Daidai R, Akamine S, Ohkubo T: Generation of microplasma jet at atmospheric pressure using a modified waveguide-based plasma torch. Surf Coat Technol 2008, 202:5275-5279.
9. Guchardi R, Hauser PC: Capacitively coupled microplasma for on-column detection of chromatographically separated inorganic gases by optical emission spectrometry. J Chromatogr A 2004, 1033:333-338.
10. Hozumi Y, Seto T, Hirasawa M, Tsuji M, Okuyama A: Kinetics of microplasma atmospheric ion generation correlated with discharge current. J. Electrostatics 2008, 67:1-6.
11. Michels A, Tombrink S, Vautz W, Miclea M, Franzke J: Spectroscopic characterization of a microplasma used as ionization source for ion mobility spectrometry. Spectrochim Acta B 2007, 62:1208-1215.
12. Chen KF, Ostrom NP, Park SJ, Eden JG: One quarter million (500 × 500) pixel arrays of silicon microcavity plasma devices: luminous efficacy above6 lumens/watt with Ne/50% Xe mixtures and a green phosphor. Appl Phys Lett 2006, 88:061121-061123.
13. Isberg J, Hammersberg J, Johnsson E, Wikstrom T, Twitchen DJ, Whitehead AJ, Coe SE, Scarsbrook GA: High carrier mobility in single-crystal plasmadeposited diamond. Science 2002, 297:1670-1672.
14. Masuda H, Yasui K, Watanabe M, Nishio K, Rao TN, Fujishima A: Fabrication of ordered diamond/metal nanocomposite structure. Chem Lett 2000, 10:1112-1113.
15. Kim YD, Choi W, Wakimoto H, Usami S, Tomokage H, Ando T: Direct observation of electron emission site on boron-doped polycrystalline diamond thin films using an ultra-high-vacuum scanning tunneling microscope. Appl Phys Lett 1999, 75:3219-3221.
16. Zhou D, McCauley TG, Qin LC, Krauss AR, Gruen DM: Synthesis of nanocrystalline diamond thin films from Ar-CH4 microwave plasma. J Appl Phys 1998, 83:540-543.
17. Stacey A, Prawer S, Rubanov S, Ahkvlediani R, Michaelson S, Hoffman A: The effect of temperature on the secondary electron emission yield from single crystal and polycrystalline diamond surfaces. Appl Phys Lett 2009, 95:262109(1-3).
18. Bhattacharyya S, Auciello O, Birrell J, Carlisle JA, Curtiss LA, Goyette AN, Gruen DM, Krauss AR, Schlueter J, Sumant A, Zapol P: Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films. Appl Phys Lett 2001, 79:1441-1443.
19. Joseph PT, Tai NH, Lee CY, Niu H, Pong WF, Lin IN: Field emission enhancement in nitrogen-ion-implanted ultrananocrystalline diamond films. J Appl Phys 2008, 103:043720(1-7).
20. Chen YC, Tai NH, Lin IN: Substrate temperature effects on the electron field emission properties of nitrogen doped ultra-nanocrystalline diamond. Diam Relat Mater 2008, 17:457-461.
21. Tzeng YF, Liu KH, Lee YC, Lin SJ, Lin IN, Lee CY, Chiu HT: Fabrication of an ultra-nanocrystalline diamond-coated silicon wire array with enhanced field-emission performance. Nanotechnology 2007, 18:435703(1-5).
22. Tzeng YF, Lee CY, Chiu HT, Tai NH, Lin IN: Electron field emission properties on ultra-nano-crystalline diamond coated silicon nanowires. Diam Relat Mater 2008, 17:1817-1820.
23. Zhang WJ, Wu Y, Wong WK, Meng XM, Chan CY, Bello I, Lifshitz Y, Lee ST: Structuring nanodiamond cone arrays for improved field emission. Appl Phys Lett 2003, 83:3365-3367.
24. Zhang WJ, Meng XM, Chan CY, Wu Y, Bello I, Lee ST: Oriented singlecrystal diamond cones and their arrays. Appl Phys Lett 2003, 82:2622-2624.
25. Zhang WJ, Wu Y, Chan CY, Wong WK, Meng XM, Bello I, Lifshitz Y, Lee ST: Structuring single-and nano-crystalline diamond cones. Diam Relat Mater 2004, 13:1037-1043.
26. Wang Q, Wang ZL, Li JJ, Huang Y, Li YL, Gu CZ, Cui Z: Field electron emission from individual diamond cone formed by plasma etching. Appl Phys Lett 2006, 89:063105.
27. Hsu CH, Lo HC, Chen CF, Wu CT, Hwang JS, Das D, Tsai J, Chen LC, Chen KH: Generally applicable self-masked dry etching technique for nanotip array fabrication. Nano Lett 2004, 4:471-475.
28. Yoshida H, Urushido T, Miyake H, Hiramatsu K: Formation of GaN self-organized nanotips by reactive ion etching. Jpn. J. Appl. Phys 2001, 40(Part 2):L1301-L1304.
29. Shenderova OA, Padgett CW, Hu Z, Brenner DW: Diamond nanorods. J Vac Sci Technol B 2005, 23:2457-2464.
30. Barnard AS: Structural properties of diamond nanowires: theoretical predictions and experimental progress. Rev Adv Mater Sci 2004, 6:94-119.
31. Shang N, Papakonstantinou P, Wang P, Zakharov A, Palnitkar U, Lin IN, Chu M, Stamboulis A: Self-assembled growth, microstructure, and fieldemission high performance of ultrathin diamond nanorods. ACS Nano 2009, 2:1032-1038.
32. Sun L, Gong J, Zu D, Zhu Z, He S: Diamond nanorods from carbon nanotubes. Adv Mater 2004, 16:1849-1853.
33. Vlasov II, Lebedev OI, Ralchenko VG, Goovaerts E, Bertoni G, Tendeloo GV, Konov VI: Hybrid diamond-graphite nanowires produced by microwave plasma chemical vapor deposition. Adv Mater 2007, 19:4058-4062.
34. Fowler RH, Nordheim L: Electron emission in intense electric fields. Proc R Soc London, Ser A 1928, 119:173-181.
35. 4plasma. J Phys D: Appl Phys 2012, 45:365303-365311.
36. Teii K, Ikeda T: Conductive and resistive nanocrystalline diamond films studied by Raman spectroscopy. Diam Relat Mater 2007, 16:753-756.
37. Xiao X, Birrell J, Gerbi JE, Auciello O, Carlisle JA: Low temperature growth of ultrananocrystalline diamond. Appl Phys Lett 2004, 96:2232-2239.
38. Liu J, Zhirnov VV, Myers AF, Wojak GJ, Choi WB, Hren JJ, Wolter SD, McClure MT, Stoner BR, Glass JT: Field emission characteristics of diamond coated silicon field emitters. J Vac Sci Technol B 1995, 13(2):422-426.