Effects of heat treatment on the chemical states of O1s and Sn3d at the surface of SnOx:F films by APCVD

Materials Letters

Volumn 90, Issue , 2013, Pages 37-40

  Yang, Jingkai ^a   Zhao, Hongli ^a   Zhang, Fucheng ^a  

^a YANSHAN UNIVERSITY   (China)

Author keywords

Chemical states; Chemical vapor deposition; Heat treatment; X ray photoelectron spectroscopy

Indexed keywords

BINDING ENERGY; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; FLUORINE; HEAT TREATMENT; PHOTOELECTRONS; PHOTONS; STOICHIOMETRY; SURFACE CHEMISTRY; TIN;

AFTER-HEAT TREATMENT; AS-DEPOSITED FILMS; CHEMICAL STATE; EFFECTS OF HEAT TREATMENT; NON STOICHIOMETRY; RELATIVE CONCENTRATION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84870679978     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2012.07.055     Document Type: Article

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