XPS depth profiling studies of L-CVD SnO 2 thin films

Applied Surface Science

Volumn 252, Issue 21, 2006, Pages 7730-7733

  Kwoka, M ^a   Ottaviano, L ^b   Passacantando, M ^b   Santucci, S ^b   Szuber, J ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Depth profiling; Thin films; Tin dioxide; XPS

Indexed keywords

CHEMICAL VAPOR DEPOSITION; INTERFACES (MATERIALS); SUBSTRATES; TIN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC CONCENTRATION; DEPTH PROFILING; TIN DIOXIDE;

THIN FILMS;

EID: 33747182831     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.03.065     Document Type: Article

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