Electrical, structural and optical properties of SnO2:F thin films: Effect of the substrate temperature

Journal of Alloys and Compounds

Volumn 488, Issue 1, 2009, Pages 350-355

  Yadav, A A ^a   Masumdar, E U ^a   Moholkar, A V ^b   Neumann Spallart, M ^c   Rajpure, K Y ^d   Bhosale, C H ^d  

^a Department of Physics   (India)

^b Chonnam National University   (South Korea)

^c Centre National de la Recherche Scientifique   (France)

^d SHIVAJI UNIVERSITY   (India)

Author keywords

Electrical properties; Fluorine doped tin oxide; Optical properties; Spray pyrolysis; Thin films; X ray diffraction

Indexed keywords

AS-DEPOSITED FILMS; CHEMICAL SPRAY PYROLYSIS; COST EFFECTIVE; DIFFERENT SUBSTRATES; ELECTRICAL PROPERTY; FLUORINE DOPED TIN OXIDE; GLASS SUBSTRATES; HIGHER TEMPERATURES; N-TYPE CONDUCTIVITY; OPTICAL AND ELECTRICAL CHARACTERIZATION; OPTICAL BAND GAP ENERGY; PREFERENTIAL GROWTH; SEM; STANNIC CHLORIDE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; VISIBLE REGION; XRD ANALYSIS;

CHLORINE COMPOUNDS; CRACKING (CHEMICAL); DIFFRACTION; ELECTRIC PROPERTIES; FLUORINE; HALL EFFECT; MAGNETIC FIELD EFFECTS; OPTICAL PROPERTIES; OXIDE FILMS; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; TIN; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILMS;

EID: 70449724621     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.08.130     Document Type: Article

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