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Volumn 101, Issue 22, 2012, Pages

Gate tunable graphene-silicon Ohmic/Schottky contacts

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE NEUTRALITY; GATE VOLTAGES; IV CHARACTERISTICS; LOW BIAS; OHMIC BEHAVIOR; P-TYPE SILICON; PHOTOINDUCED CURRENTS; POLYMER ELECTROLYTE; SCHOTTKY BARRIER HEIGHTS; SCHOTTKY JUNCTIONS; SILICON SUBSTRATES; THREE ORDERS OF MAGNITUDE; TOP GATE; WORK-FUNCTION DIFFERENCE;

EID: 84870528018     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4768921     Document Type: Article
Times cited : (43)

References (30)
  • 2
    • 78650156443 scopus 로고    scopus 로고
    • 10.1103/PhysRevLett.105.256805
    • D. K. Efetov and P. Kim, Phys. Rev. Lett. 105, 256805 (2010). 10.1103/PhysRevLett.105.256805
    • (2010) Phys. Rev. Lett. , vol.105 , pp. 256805
    • Efetov, D.K.1    Kim, P.2
  • 27
    • 84870489684 scopus 로고    scopus 로고
    • See supplementary material at E-APPLAB-101-034249 for the FET device geometry and experimental results
    • See supplementary material at http://dx.doi.org/10.1063/1.4768921 E-APPLAB-101-034249 for the FET device geometry and experimental results.
  • 30
    • 79952091341 scopus 로고    scopus 로고
    • 10.1063/1.3556587
    • G. Gu and Z. J. Xie, Appl. Phys. Lett. 98, 083502 (2011). 10.1063/1.3556587
    • (2011) Appl. Phys. Lett. , vol.98 , pp. 083502
    • Gu, G.1    Xie, Z.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.