|
Volumn 22, Issue 44, 2012, Pages 23650-23654
|
Dual length-scale nanotip arrays with controllable morphological features for highly sensitive SERS applications
|
Author keywords
[No Author keywords available]
|
Indexed keywords
DOUBLE LAYERED;
ELECTRON BEAM EVAPORATION;
ETCHING PROCESS;
ETCHING TIME;
FACE-CENTERED CUBIC STRUCTURE;
HIGH SENSITIVITY;
HOLOGRAPHIC LITHOGRAPHY;
LENGTH SCALE;
MORPHOLOGICAL FEATURES;
SENSING PLATFORMS;
SURFACE ENHANCED RAMAN SCATTERING (SERS);
TUNABILITIES;
PRISMS;
SURFACE ROUGHNESS;
SURFACE SCATTERING;
NANOTIPS;
|
EID: 84870446622
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c2jm34470j Document Type: Article |
Times cited : (13)
|
References (27)
|