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Volumn 22, Issue 44, 2012, Pages 23650-23654

Dual length-scale nanotip arrays with controllable morphological features for highly sensitive SERS applications

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE LAYERED; ELECTRON BEAM EVAPORATION; ETCHING PROCESS; ETCHING TIME; FACE-CENTERED CUBIC STRUCTURE; HIGH SENSITIVITY; HOLOGRAPHIC LITHOGRAPHY; LENGTH SCALE; MORPHOLOGICAL FEATURES; SENSING PLATFORMS; SURFACE ENHANCED RAMAN SCATTERING (SERS); TUNABILITIES;

EID: 84870446622     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c2jm34470j     Document Type: Article
Times cited : (13)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.