Growth characterization of electron-beam-induced silver deposition from liquid precursor

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 6, 2012, Pages

  Ocola, Leonidas E ^a   Joshi Imre, Alexandra ^a   Kessel, Cynthia ^b   Chen, Brian ^c   Park, Jonathan ^d   Gosztola, David ^a   Divan, Ralu ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b George Washington Middle School   (United States)

^c ILLINOIS MATHEMATICS AND SCIENCE ACADEMY   (United States)

^d NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON ENERGIES; FABRICATION METHOD; GROWTH CHARACTERIZATION; LIQUID CELLS; LIQUID PRECURSORS; MINIMUM FEATURE SIZES; NANOOPTICS; OPTICAL ABSORBANCE; OPTIMAL ENERGY; PHYSICAL STRUCTURES; SCANNING ELECTRON MICROSCOPE; SILVER DEPOSITION; SILVER PARTICLES;

DEPOSITS; LIQUIDS; NANOPHOTONICS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILVER DEPOSITS;

SILVER;

EID: 84870351202     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4765629     Document Type: Article

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