Scanning electron microscopy for in situ monitoring of semiconductor-liquid interfacial processes: Electron assisted reduction of Ag ions from aqueous solution on the surface of TiO2 rutile nanowire

Journal of Physical Chemistry C

Volumn 114, Issue 40, 2010, Pages 17233-17237

  Kolmakova, Natalia ^a   Kolmakov, Andrei ^a  

^a SOUTHERN ILLINOIS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANOPARTICLE; AQUEOUS SOLUTIONS; CHEMICAL PROCESS; COMPOSITIONAL ANALYSIS; ENVIRONMENTAL CELLS; ENVIRONMENTAL REMEDIATION; IN-SITU; IN-SITU MONITORING; IN-VIVO; INTERFACIAL CHEMICALS; INTERFACIAL PROCESS; LIQUID INTERFACE; METAL OXIDES; NANOSCOPIC SCALE; PHOTO-REDUCTION; PRIMARY ELECTRON BEAMS; REAL TIME MONITORING; REALTIME IMAGING; SECONDARY ELECTRONS; TIO;

CHEMICAL ENGINEERING; DENDRIMERS; ELECTRON BEAMS; FUEL CELLS; METALLIC COMPOUNDS; NANOWIRES; OXIDE MINERALS; PHASE INTERFACES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SILVER; SOLUTIONS;

ELECTRONS;

EID: 77957870255     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1044546     Document Type: Article

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