Silica Membranes - Preparation by Chemical Vapour Deposition and Characteristics

Membranes for Membrane Reactors: Preparation, Optimization and Selection

Volumn , Issue , 2011, Pages 335-356

  Galuszka, J ^a   Giddings, T ^a  

^a NATURAL RESOURCES CANADA   (Canada)

Author keywords

Atmospheric pressure chemical vapour deposition (APCVD); Chemical vapour deposition (CVD) condensation of precursor compound, or compounds from gas phase onto a substrate, producing a solid deposit; CVD apparatus consisting of basic components; Hydrothermal stability of a Canmet ENERGY silica H membranes; Microporous silica hydrogen perm selective membranes (H membranes) potentially more practical alternative to Pd membranes; Silica membrane application; Silica membrane structure and transport mechanism; Silica membranes preparation by chemical vapour deposition and characteristics; TEOS thermal decomposition mechanism leading to silica film formation; Water Gas Shift Reaction (WGSR) and membrane assisted WGSR

Indexed keywords

EID: 84870290695     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9780470977569.ch12     Document Type: Chapter

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