Stability of a silica membrane prepared by CVD using γ- and α-alumina tube as the support tube in the HI-H2O gaseous mixture

Journal of Membrane Science

Volumn 215, Issue 1-2, 2003, Pages 293-302

  Hwang, Gab Jin ^a   Kim, Jong Won ^a   Choi, Ho Sang ^b   Onuki, Kaoru ^c  

^a Korea Institute of Energy Research (KIER)   (South Korea)

^b Kyungil University   (South Korea)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Chemical vapor deposition; Gas separation; Hydrogen permselectivity; Inorganic membrane; Silica alumina membrane

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MEMBRANES; PORE SIZE;

SILICA MEMBRANES;

SILICA;

ALPHA ALUMINA; ALUMINUM DERIVATIVE; GAMMA ALUMINA; HYDRIODIC ACID; IODINE DERIVATIVE; SILANE DERIVATIVE; SILICON DIOXIDE; TETRAETHOXYSILANE; UNCLASSIFIED DRUG; WATER;

MEMBRANE TECHNOLOGY; SILICA GEL; STABILITY; TUBE ARRAY;

ARTICLE; ARTIFICIAL MEMBRANE; DECOMPOSITION; GAS PERMEABILITY; MEMBRANE STABILIZATION; PRIORITY JOURNAL; TEMPERATURE SENSITIVITY; VAPOR;

EID: 0037446086     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0376-7388(03)00022-X     Document Type: Article

References (17)

1. Nakajima H., Ikenoya K., Onuki K., Shimizu S. Closed cycle continuous hydrogen production test by thermochemical IS process. Kagaku Kougaku Ronbunshu. 24(2):1998;352.
2. 2O-HI gaseous mixture using the silica membranes prepared by chemical vapor deposition. J. Membr. Sci. 162:1999;83.
3. Onuki K., Hwang G.-J., Shimizu S. Electrodialysis of hydriodic acid in the presence of iodine. J. Membr. Sci. 175:2000;171.
4. G.-J. Hwang, K. Onuki, S. Shimizu, Studies on hydrogen separation membrane for IS process, Membrane preparation with porous α-alumina tube, JAERI, Research Report 98-002, JAERI, Ibaraki, Japan, 1998.
5. 2O-HI gaseous mixture using a silica membrane. AIChE J. 46(1):2000;92.
6. Hwang G.-J., Onuki K. Simulation study on the catalytic decomposition of hydrogen iodide in a membrane reactor with a silica membrane for the thermochemical water-splitting IS process. J. Membr. Sci. 194:2001;207.
7. 2 films formed by chemical vapor deposition. AIChE Symp. Ser. 85(268):1989;68.
8. Gallaher G.R., Liu P.K.T. Characterization of ceramic membranes I. Thermal and hydrothermal stabilities of commercial 40 Å membranes. J. Membr. Sci. 92:1994;29.
9. Ha H.Y., Nam S.W., Hong S.-A., Lee W.K. Chemical vapor deposition of hydrogen-permselective silica film on porous glass supports from tetraethylorthosilicate. J. Membr. Sci. 85:1993;279.
10. Wu J.C.S., Sabol H., Smith G.W., Flowers D.L., T Liu P.K. Characterization of hydrogen-permselective microporous ceramic membranes. J. Membr. Sci. 96:1994;275.
11. 2 membrane formed in pores of alumina support tube by chemical vapor deposition with tetraethylorthosilicate. Ind. Eng. Chem. Res. 33:1994;2096.
12. 2-Vycor membranes. J. Membr. Sci. 87:1994;281.
13. 2 permselective silica membranes by alternating reactant vapor deposition. Ind. Eng. Chem. Res. 34:1995;168.
14. Xomeritakis G., Lin Y.S. Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition. J. Membr. Sci. 120:1996;261.
15. 2 membrane formed in macropores of an α-alumina support tube. Int. J. Hydrogen Energy. 21(3):1996;183.
16. Sea B.-K., Kusakabe K., Morooka S. Pore size control and gas permeation kinetics of silica membranes by pyrolysis of phenyl-substituted ethoxysilanes with cross-flow through a porous support wall. J. Membr. Sci. 130:1997;41.
17. Chang C.-H., Gopalan R., Lin Y.S. A comparative study on thermal and hydrothermal stability of alumina, titania and zirconia membranes. J. Membr. Sci. 91:1994;27.