Development of pore size-controlled silica membranes for gas separation by chemical vapor deposition

Journal of Membrane Science

Volumn 315, Issue 1-2, 2008, Pages 93-99

  Ohta, Yudai ^a   Akamatsu, Kazuki ^a   Sugawara, Takashi ^a   Nakao, Aiko ^b   Miyoshi, Akira ^a   Nakao, Shin Ichi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Chemical vapor deposition; Gas separation; Intermediate; Pore size; Silica membrane

Indexed keywords

PHENYL GROUPS; SILICA MEMBRANE;

CHEMICAL VAPOR DEPOSITION; HYDROGEN; OXYGEN; SILICA;

PORE SIZE;

DIMETHOXYDIPHENYLSILANE; OXYGEN; PHENYL GROUP; PHENYLTRIMETHOXYSILANE; SILANE DERIVATIVE; SILICON DIOXIDE; SULFUR HEXAFLUORIDE; TETRAMETHOXYSILANE; UNCLASSIFIED DRUG;

CHEMICAL VAPOR DEPOSITION; HYDROGEN; OXYGEN; PORE SIZE; SILICA;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; GAS PERMEABILITY; PRIORITY JOURNAL; QUANTUM CHEMISTRY; SEPARATION TECHNIQUE;

EID: 41949141815     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.memsci.2008.02.008     Document Type: Article

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