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Volumn 552, Issue , 2013, Pages 127-130

Impact of oxygen source parameters on homoepitaxial ZnO films grown at low-temperature on Zn-polar substrates

Author keywords

Atomic force microscopy; Homoepitaxy; Molecular beam epitaxy; Oxygen plasma; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; METALLIC FILMS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; OXYGEN; PHOTOLUMINESCENCE; SEMICONDUCTOR QUANTUM WELLS; SINGLE CRYSTALS; SURFACE DEFECTS; TEMPERATURE; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

EID: 84869873866     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.10.034     Document Type: Article
Times cited : (16)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.