Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash tools

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 97-100

  Srivastava, A K ^a  

^a AXCELIS TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHARACTERIZATION; OXYGEN; PLASMA APPLICATIONS; QUARTZ; SILICON WAFERS;

ATOMIC OXYGEN CONCENTRATION; PLASMA ASH TOOL; QUARTZ CRYSTAL MICROBALANCE;

MICROSENSORS;

EID: 0035105544     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1335681     Document Type: Article

References (2)

1. V. Matijasevic, E. L. Garwin, and R. H. Hammond, Rev. Sci. Instrum. 61, 1747 (1990).
2. V. Tsionsky and E. Gileadi, Langmuir 10, 2830 (1994).