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Volumn 51, Issue 10 PART 2, 2012, Pages
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Analysis of chlorine ions in antimony-doped tin oxide thin film using synchrotron grazing incidence X-ray diffraction
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Author keywords
[No Author keywords available]
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Indexed keywords
ANTIMONY-DOPED TIN OXIDE;
ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION;
CHLORINE IONS;
DOPING MECHANISM;
FILM MICROSTRUCTURES;
GLASS SUBSTRATES;
GRAZING-INCIDENCE X-RAY DIFFRACTION;
MICROSTRUCTURE OF FILMS;
VISIBLE SPECTRAL RANGE;
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
CHLORINE;
ELECTRIC PROPERTIES;
MICROSTRUCTURE;
SUBSTRATES;
TIN;
TIN OXIDES;
X RAY DIFFRACTION;
SEMICONDUCTOR DOPING;
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EID: 84869107596
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.51.10NE28 Document Type: Article |
Times cited : (2)
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References (19)
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