Studies on structural and electrical properties of spray deposited SnO 2:F thin films as a function of film thickness

Materials Science and Engineering: B

Volumn 113, Issue 2, 2004, Pages 143-148

  Elangovan, E ^a,b   Singh, M P ^b   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Fluorine doping and structural properties; SnCl2 precursor; Spray pyrolysis; Tin oxide thin films

Indexed keywords

CHARGE CARRIERS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC RESISTANCE; FILM GROWTH; GLASS; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SCATTERING; SPRAYING; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

FLUORINE DOPING AND STRUCTURAL PROPERTIES; SNCL2 PRECURSOR; SPRAY PYROLYSIS; TIN OXIDE THIN FILMS;

THIN FILMS;

EID: 4644299590     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(04)00385-X     Document Type: Article

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