TiO2-coated transparent conductive oxide (SnO2:F) films prepared by atmospheric pressure chemical vapor deposition with high durability against atomic hydrogen

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 8-11, 2006, Pages

  Kambe, Mika ^a,b   Sato, Kazuo ^b   Kobayashi, Daisuke ^b   Kurokawa, Yasuyoshi ^a   Miyajima, Shinsuke ^a   Fukawa, Makoto ^b   Taneda, Naoki ^b   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Asahi Class Co Ltd   (Japan)

Author keywords

Atomic hydrogen; Durability; Sno2; Solar cell; Tio2; Transparent conductive oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; OPACITY; SECONDARY ION MASS SPECTROMETRY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN; TRANSPARENT CONDUCTIVE OXIDE; VERY HIGH FREQUENCY (VHF) PLASMA;

TITANIUM DIOXIDE;

EID: 33645961618     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L291     Document Type: Article

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