Structural analysis of monolayered and bilayered SnO 2 thin films

Surface and Coatings Technology

Volumn 211, Issue , 2012, Pages 24-28

  Djerdj, Igor ^a   Gracin, Davor ^a   Juraić, Krunoslav ^a   Meljanac, Daniel ^a   Bogdanović Radović, Ivančica ^a   Pletikapić, Galja ^a  

^a RUDER BO KOVI INSTITUTE   (Croatia)

Author keywords

Preferred orientation; Rietveld analysis; Thin film; Transparent conductive oxides; X ray diffraction

Indexed keywords

AS-DEPOSITED FILMS; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ATOMIC FIELDS; DEPOSITION PARAMETERS; ELECTRICAL RESISTIVITY; FILM SURFACES; FLUORINE-DOPED; MICROSTRUCTURAL PROPERTIES; POST-DEPOSITION; PREFERRED ORIENTATIONS; STRUCTURAL PARAMETER; TRANSPARENT CONDUCTIVE OXIDES; XRD PATTERNS;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; FLUORINE; RIETVELD ANALYSIS; RIETVELD REFINEMENT; X RAY DIFFRACTION;

THIN FILMS;

EID: 84868636365     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.06.045     Document Type: Article

References (19)

1. Kim C.Y., Riu D.H. Thin Solid Films 2011, 519:3081.
2. Gracin D., Juraić K., Gajović A., Dubček P., Djerdj I., Tomašić N., Krajinović S., Milun M., Bernstorff S. Vacuum 2007, 82:266.
3. Djerdj I., Garnweitner G., Arcon D., Pregelj M., Jaglicic Z., Niederberger M. J. Mater. Chem. 2008, 18:5208.
4. Djerdj I., Jagličić Z., Arčon D., Niederberger M. Nanoscale 2010, 2:1096.
5. Schropp R.E.I., Zeman M. Amorphous and Microcrystalline Silicon Solar Cells: Modelling, Materials and Device Technology 1998, Kluwer Academic Publishers, Norwell.
6. J. Löffler, Surfaces Interfaces and Devices, PhD thesis, Utrecht University, Utrecht, 2005.
7. Yadava Y.P., Denicolo G., Arias A.C., Roman L.S., Hummelgen I.A. Mater. Chem. Phys. 1997, 48:263.
8. Yadav J.B., Patil R.B., Puri R.K., Puri V. Mater. Sci. Eng., B 2007, 139:69.
9. Siciliano P. Sens. Actuators, B 2000, 70:153.
10. Elangovan E., Ramamurthi K. Appl. Surf. Sci. 2005, 249:183.
11. Karapatnitski I.A., Mit K.A., Mukhamedshina D.M., Beisenkhanov N.B. Surf. Coat. Technol. 2002, 151:76.
12. Rodriguez-Carvajal J. FULLPROF - a Program for Rietveld Refinement 2001, Laboratorie Leon Brillouin, CEA-Saclay, France.
13. Thompson P., Cox D.E., Hastings J.B. J. Appl. Crystallogr. 1987, 20:79.
14. Djerdj I., Tonejc A.M. J. Alloys Compd. 2006, 413:159.
15. Dollase W. J. Appl. Crystallogr. 1986, 19:267.
16. Moholkar A.V., Pawar S.M., Rajpure K.Y., Almari S.N., Patil P.S., Bhosale C.H. Sol. Energy Mater. Sol. Cells 2008, 92:1439.
17. Mientus R., Ellmer K. Surf. Coat. Technol. 1998, 98:1267.
18. Djerdj I., Tonejc A.M., Tonejc A., Radic N. Vacuum 2005, 80:151.
19. Okolo B., Lamparter P., Welzel U., Wagner T., Mittemeijer E.J. Thin Solid Films 2005, 474:50.