One-dimensional autocorrelation and power spectrum density functions of irregular regions

Ultramicroscopy

Volumn 124, Issue , 2013, Pages 13-19

  Nečas, David ^a   Klapetek, Petr ^b,c  

^a MASARYK UNIVERSITY   (Czech Republic)

^b CZECH METROLOGY INSTITUTE   (Czech Republic)

^c BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

Atomic force microscopy; Frequency analysis; Roughness; Scanning probe microscopy

Indexed keywords

DATA EVALUATION; FREQUENCY ANALYSIS; NANO-SCALE ROUGHNESS; NANO-STRUCTURED; POWER SPECTRUM DENSITY FUNCTIONS; SEMICONDUCTOR STRUCTURE; SPECTRAL PROPERTIES; TECHNOLOGICAL PROCESS;

ALGORITHMS; ATOMIC FORCE MICROSCOPY; FAST FOURIER TRANSFORMS; NANOTECHNOLOGY; SCANNING PROBE MICROSCOPY; SURFACE ROUGHNESS;

BENCHMARKING;

NANOMATERIAL; NANOPARTICLE;

ARTICLE; CHEMICAL STRUCTURE; COMPUTER PROGRAM; CONTROLLED STUDY; CORRELATION FUNCTION; FOURIER TRANSFORMATION; INFORMATION PROCESSING; MATHEMATICAL ANALYSIS; NANOTECHNOLOGY; ONE DIMENSIONAL AUTOCORRELATION FUNCTION; POWER SPECTRUM; QUALITY CONTROL; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR; SURFACE PROPERTY; ALGORITHM; FOURIER ANALYSIS; METHODOLOGY; ULTRASTRUCTURE; ACCURACY; ATOMIC FORCE MICROSCOPY; MATHEMATICAL COMPUTING; MATHEMATICAL MODEL; PHYSICAL CHEMISTRY; STRUCTURE ANALYSIS;

ALGORITHMS; FOURIER ANALYSIS; MICROSCOPY, SCANNING PROBE; NANOPARTICLES; NANOTECHNOLOGY; SURFACE PROPERTIES;

EID: 84868550581     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.08.002     Document Type: Article

References (15)

1. Dumas P., Bouffakhreddine B., Amra C., Vatel O., Andre E., Galindo G., Salvan F. Quantitative microroughness analysis down to the nanometer scale. Europhysics Letters 1993, 22:717-722.
2. Tanenbaum D.M., Laracuente A.L., Gallagher A. Surface roughening during plasma-enhanced chemical-vapour deposition of hydrogenated amorphous silicon on crystal silicon substrates. Physical Review B 1997, 56:4243-4250.
3. Ojeda F., Cuerno R., Salvarezza R., Vázquez L. Dynamics of rough interfaces in chemical vapor deposition. experiments and a model for silica films. Physical Review Letters 2000, 84:3125-3128.
4. Stanley H.E., Barabási A.L. Fractal Concepts in Surface Growth 1995, Cambridge University Press, Cambridge.
5. Yoon J.-G., Oh H.K., Lee S.J. Growth characteristics and surface roughening of vapor-deposited mgo thin films. Physical Review B 1999, 60:2839-2843.
6. Drotar J.T., Zhao Y.-P., Lu T.-M., Wang G.-C. Surface roughening in shadowing growth and etching in 2+1 dimensions. Physical Review B 2000, 62:2118-2125.
7. Bobji M.S., Biswas S.K. Estimation of hardness by nanoindentation of rough surfaces. Journal of Materials Research 1998, 13:3227-3233.
8. Zemek J., Olejnik K., Klapetek P. Photoelectron spectroscopy from randomly corrugated surfaces. Surface Science 2008, 602:1440-1446.
9. Ohlídal I., Lukeš F. Ellipsometric parameters of randomly rough surfaces. Optics Communications 1972, 5:323-326.
10. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S. Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy. Surface and Interface Analysis 2006, 38:842-846.
11. Franta D., Ohlídal I., Nečas D. Optical quantities of rough films calculated by Rayleigh-Rice theory. Physica Status Solidi C 2008, 5:1395-1398.
12. Bracewell R. The Fourier Transform & Its Applications 1999, McGraw-Hill, Singapore.
13. Nečas D., Klapetek P. Gwyddion. an open-source software for SPM data analysis. Central European Journal of Physics 2012, 10:181-188.
14. Dunn P.F. Measurement and Data Analysis for Engineering and Science 2005, McGraw-Hill, New York.
15. Frigo M., Johnson S.G. The design and implementation of FFTW3. Proceedings of the IEEE 2005, 93:216-231.