Anomalous smoothing preceding island formation during growth on patterned substrates

Physical Review Letters

Volumn 109, Issue 15, 2012, Pages

  Bergamaschini, R ^a   Tersoff, J ^b   Tu, Y ^b   Zhang, J J ^c,d   Bauer, G ^c   Montalenti, F ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^d IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; COMPOSITION DEPENDENCE; CONTINUUM SIMULATIONS; HETEROEPITAXIAL SYSTEMS; ISLAND FORMATION; PATTERNED SUBSTRATES; SI(0 0 1); SURFACE DIFFUSIVITY;

EPITAXIAL GROWTH; GERMANIUM; SILICON;

SUBSTRATES;

EID: 84867312230     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.109.156101     Document Type: Article

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