Following Ostwald ripening in nanoalloys by high-resolution imaging with single-atom chemical sensitivity

Applied Physics Letters

Volumn 101, Issue 12, 2012, Pages

  Alloyeau, D ^a   Oikawa, T ^a,b   Nelayah, J ^a   Wang, G ^a   Ricolleau, C ^a  

^a UNIVERSITÉ PARIS DIDEROT   (France)

^b JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM EXCHANGE; ATOMIC SCALE; BIMETALLIC NANOPARTICLES; CHEMICAL NATURE; CHEMICAL SENSITIVITY; COMPOSITIONAL CHANGES; COPT NANOPARTICLES; EVAPORATION RATE; EXPERIMENTAL EVIDENCE; HIGH-RESOLUTION IMAGING; NANO-ALLOYS; OSTWALD RIPENING MECHANISM; PT ATOMS;

CARBON FILMS; COBALT; NANOPARTICLES; OSTWALD RIPENING; PLATINUM;

ATOMS;

EID: 84866863687     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4754111     Document Type: Article

References (34)

1. I. M. Lifshitz and V. V. Slyozov, J. Phys. Chem. Solids 19, 35 (1961). 10.1016/0022-3697(61)90054-3
2. C. Wagner, Z. Elektrochem. 65, 581 (1961).
3. D. Alloyeau, G. Prévot, Y. Le Bouar, T. Oikawa, C. Langlois, A. Loiseau, and C. Ricolleau, Phys. Rev. Lett. 105, 255901 (2010). 10.1103/PhysRevLett.105.255901
4. M. Di Vece, S. Bals, J. Verbeeck, P. Lievens, and G. Van Tendeloo, Phys. Rev. B 80, 125420 (2009). 10.1103/PhysRevB.80.125420
5. A. A. Herzing, M. Watanabe, J. K. Edwards, M. Conte, Z.-R. Tang, G. J. Hutchings, and C. J. Kiely, Faraday Discuss. 138, 337 (2008). 10.1039/b706293c
6. D. Alloyeau, C. Mottet, and C. Ricolleau, Nanoalloys: Synthesis, Structure and Properties (Springer-Verlag, London, 2012).
7. D. Alloyeau, C. Langlois, C. Ricolleau, Y. Le Bouar, and A. Loiseau, Nanotechnology 18, 375301 (2007). 10.1088/0957-4484/18/37/375301
8. D. Alloyeau, C. Ricolleau, C. Langlois, Y. Le Bouar, and A. Loiseau, Beilstein J. Nanotechnol. 1, 55 (2010). 10.3762/bjnano.1.7
9. D. Alloyeau, C. Ricolleau, T. Oikawa, C. Langlois, Y. Le Bouar, and A. Loiseau, Ultramicroscopy 108, 656 (2008). 10.1016/j.ultramic.2007.10.006
10. D. Alloyeau, C. Ricolleau, T. Oikawa, C. Langlois, Y. Le Bouar, and A. Loiseau, Ultramicroscopy 109, 788 (2009). 10.1016/j.ultramic.2009.02.002
11. R. F. Egerton, Electron Energy-Loss Spectroscopy in Electron Microscope (Plemium, New York, 1996), p. 301.
12. See supplementary material at http://dx.doi.org/10.1063/1.4754111 E-APPLAB-101-072239 for the film thickness measurement methods, the time series HRTEM experiments on a 2 nm Pt NPs, and the dose-reduced HRTEM analyses.
13. C. Ricolleau, J. Nelayah, T. Oikawa, Y. Kohno, N. Braidy, G. Wang, F. Hue, and D. Alloyeau, JEOL News 47, 2 (2012).
14. Y. Kohno, E. Okunishi, T. Tomita, I. Ishikawa, T. Kaneyama, Y. Ohkura, Y. Kondo, and T. Isabell, Microsc. Anal. Nanotechnol. 24, S9-S13 (2010).
15. M. Haider, S. Uhlemann, E. Schwan, H. Rose, B. Kabius, and K. Urban, Nature 392, 768 (1998). 10.1038/33823
16. J. Iijima, Optik (Stuttgart) 48, 193 (1977).
17. J. O. Bovin, R. Wallenberg, and D. J. Smith, Nature 317, 47 (1985). 10.1038/317047a0
18. B. Gamm, H. Blank, R. Popescu, R. Schneider, A. Beyer, A. Gölzhäuser, and D. Gerthsen, Microsc. Microanal. 18, 212 (2012) 10.1017/S1431927611012232.
19. D. Alloyeau, B. Freitag, S. Dag, L. W. Wang, and C. Kisielowski, Phys. Rev. B 80, 014114 (2009). 10.1103/PhysRevB.80.014114
20. C. O. Girit, J. C. Meyer, R. Erni, M. D. Rossell, C. Kisielowski, L. Yang, C.-H. Park, M. F. Crommie, M. L. Cohen, S. G. Louie, and A. Zettl, Science 323, 1705 (2009). 10.1126/science.1166999
21. C. Kisielowski, Q. M. Ramasse, L. P. Hansen, M. Brorson, A. Carlsson, A. M. Molenbroek, H. Topsoe, and S. Helveg, Angew. Chem., Int. Ed. 49, 2708 (2010). 10.1002/anie.200906752
22. M. Fllueli, P. A. Buffat, and J. P. Borel, Surf. Sci. 202, 343 (1988). 10.1016/0039-6028(88)90079-9
23. M. Klimenkov, W. Matz, and J. v. Borany, Nucl. Instrum. Methods Phys. Res. B 168, 367 (2000). 10.1016/S0168-583X(99)01075-7
24. W. J. Zhang and D. E. Miser, J. Nanopart. Res. 8, 1027 (2006). 10.1007/s11051-005-9056-3
25. P. Jensen, X. Blase, and P. Ordejón, Surf. Sci. 564, 173 (2004). 10.1016/j.susc.2004.06.188
26. P. A. Stadelmann, Ultramicroscopy 21, 131 (1987). 10.1016/0304-3991(87) 90080-5
27. J. Barthel and A. Thust, Ultramicroscopy 111, 27 (2010). 10.1016/j.ultramic.2010.09.007
28. A. Weickenmeier and H. Kohl, Acta Crystallogr. 47, 590 (1991).
29. A. Rose, Advances Electronics and Electron Physics (Academic, New York, 1948).
30. A. Thust, Phys. Rev. Lett. 102, 220801 (2009). 10.1103/PhysRevLett.102. 220801
31. D. R. Lide, CRC Handbook of Chemistry and Physics, 79th ed. (CRC, Boca Raton, 1998), p. 5.13, 5.24.
32. C. K. Acharya, D. I. Sullivan, and C. H. Turner, J. Phys. Chem. C 112, 13607 (2008). 10.1021/jp8034488
33. Y. Mao, J. Yuan, and J. Zhong, J. Phys.: Conden. Matter 20, 115209 (2008). 10.1088/0953-8984/20/11/115209
34. M. l. Delalande, M. J. F. Guinel, L. F. Allard, A. Delattre, R. Le Bris, Y. Samson, P. Bayle-Guillemaud, and P. Reiss, J. Phys. Chem. C 116, 6866 (2012). 10.1021/jp300037r