L 1 0 ordering of ultrasmall fept nanoparticles revealed by TEM in situ annealing

Journal of Physical Chemistry C

Volumn 116, Issue 12, 2012, Pages 6866-6872

  Delalande, Michaël ^a   Guinel, Maxime J F ^b   Allard, Lawrence F ^c   Delattre, Anastasia ^a   Le Bris, Rémy ^a   Samson, Yves ^a   Bayle Guillemaud, Pascale ^a   Reiss, Peter ^a  

^a CEA GRENOBLE   (France)

^b UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC STRUCTURE; EX-SITU ANNEALING; FE-PT NANOPARTICLE; HOMOGENEOUS COMPOSITION; IN-SITU ANNEALING; IN-SITU HEATING; LOWER LIMITS; ORDERING PROCESS; ULTRA-SMALL;

PLATINUM; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY;

NANOPARTICLES;

EID: 84859325126     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp300037r     Document Type: Article

References (19)

1. Moser, A.; Takano, K.; Margulies, D. T.; Albrecht, M.; Sonobe, Y.; Ikeda, Y.; Sun, S.; Fullerton, E. E. J. Phys. D: Appl. Phys. 2002, 35, R157
2. Sun, S.; Murray, C. B.; Weller, D.; Folks, L.; Moser, A. Science 2000, 287, 1989-1992
3. Sun, S. Adv. Mater. 2006, 18, 393-403
4. Delalande, M.; Marcoux, P. R.; Reiss, P.; Samson, Y. J. Mater. Chem. 2007, 17, 1579-1588
5. Monnier, V.; Delalande, M.; Bayle-Guillemaud, P.; Samson, Y.; Reiss, P. Small 2008, 4, 1139-1142
6. Dai, Z. R.; Sun, S. H.; Wang, Z. L. Nano Lett. 2001, 1, 443-447
7. Ding, Y.; Yamamuro, S.; Farrell, D.; Majetich, S. A. J. Appl. Phys. 2003, 93, 7411-7413
8. Tanase, M.; Nuhfer, N. T.; Laughlin, D. E.; Klemmer, T. J.; Liu, C.; Shukla, N.; Wu, X.; Weller, D. J. Magn. Magn. Mater. 2003, 266, 215-226
9. Goll, D.; Breitling, A.; Goo, N. H.; Sigle, W.; Hirscher, M.; Schutz, G. J. Iron Steel Res. Int. 2006, 13, 97-101
10. Sato, K.; Bian, B.; Hanada, T.; Hirotsu, Y. Scr. Mater. 2001, 44, 1389-1393
11. Miyazaki, T.; Kitakami, O.; Okamoto, S.; Shimada, Y.; Akase, Z.; Murakami, Y.; Shindo, D.; Takahashi, Y. K.; Hono, K. Phys. Rev. B 2005, 72, 144419-144423
12. Bonakdarpour, A.; Wenzel, J.; Stevens, D. A.; Sheng, S.; Monchesky, T. L.; Lobel, R.; Atanasoski, R. T.; Schmoeckel, A. K.; Vernstrom, G. D.; Debe, M. K.; Dahn, J. R. J. Electrochem. Soc. 2005, 152, A61
13. Elkins, K.; Li, D.; Poudyal, N.; Nandwana, V.; Jin, Z. Q.; Chen, K. H.; Liu, J. P. J. Phys. D: Appl. Phys. 2005, 38, 2306-2309
14. Delattre, A.; Pouget, S.; Jacquot, J.-F.; Samson, Y.; Reiss, P. Small 2010, 6, 932-936
15. José-Yacamán, M.; Gutierrez-Wing, C.; Miki, M.; Yang, D.-Q.; Piyakis, K. N.; Sacher, E. J. Phys. Chem. B 2005, 109, 9703-9711
16. Stamenkovic, V.; Schmidt, T. J.; Ross, P. N.; Markovic, N. M. J. Electroanal. Chem. 2003, 554-555, 191-199
17. Malheiro, A. R.; Perez, J.; Santiago, E. I.; Villullas, H. M. J. Phys. Chem. C 2010, 114, 20267-20271
18. Dmitrieva, O.; Rellinghaus, B.; Kastner, J.; Dumpich, G. J. Cryst. Growth 2007, 303, 645-650
19. Rong, C. B.; Poudyal, N.; Chaubey, G. S.; Nandwana, V.; Skomski, R.; Wu, Y. Q.; Kramer, M. J.; Liu, J. P. J. Appl. Phys. 2007, 102, 043913