Preferred orientation of 30 μm fine pitch Sn2.5Ag micro-bumps studied by synchrotron polychromatic x-ray Laue microdiffraction

Proceedings - Electronic Components and Technology Conference

Volumn , Issue , 2012, Pages 882-885

  Tian, Tian ^a   Chen, Kai ^b   Kunz, Martin ^b   Tamura, Nobumichi ^b   Zhan, Chau Jie ^c   Chang, Tao Chih ^c   Tu, King Ning ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FAST DIFFUSION; FINE PITCH; GRAIN ORIENTATION; GRAIN SIZE; LAUE MICRODIFFRACTION; LAUE PATTERNS; MICRO-BUMPS; POLYCHROMATIC X-RAYS; PREFERRED ORIENTATIONS; REFLOW PROCESS; SYNCHROTRON RADIATION WHITE BEAMS; TEST VEHICLE; X RAY MICRODIFFRACTION;

TIN;

X RAY DIFFRACTION;

EID: 84866852909     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2012.6248938     Document Type: Conference Paper

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