High quality factor and high confinement silicon resonators using etchless process

Optics Express

Volumn 20, Issue 19, 2012, Pages 21341-21345

  Griffith, Austin ^a   Cardenas, Jaime ^a   Poitras, Carl B ^a   Lipson, Michal ^a,b  

^a School of Chemical and Molecular Engineering   (United States)

^b School of Electrical and Computer Engineering Cornell University ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL CONSTANTS;

BENDING RADIUS; COUPLING REGION; EFFECTIVE INDEX; HIGH CONFINEMENT; HIGH QUALITY FACTORS; INTRINSIC QUALITY FACTORS; PROPAGATION LOSS; RACETRACK RESONATORS; SILICON RESONATORS; SILICON RING RESONATOR; TE AND TM MODES; TE MODE; THERMAL OXIDATION PROCESS; TM MODES;

OPTICS;

EID: 84866252553     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.021341     Document Type: Article

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