Low-loss silicon-on-insulator shallow-ridge TE and TM waveguides formed using thermal oxidation

Applied Optics

Volumn 48, Issue 5, 2009, Pages 958-963

  Pafchek, R ^a   Tummidi, R ^a   Li, J ^a,b   Webster, M A ^a,c   Chen, E ^d   Koch, T L ^a  

^a LEHIGH UNIVERSITY   (United States)

^b SUN MICROSYSTEMS   (United States)

^c Lightwire Inc   (United States)

^d LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON; SILICON ON INSULATOR TECHNOLOGY; THERMOOXIDATION; WAVEGUIDES;

FABRICATION PROCESS; FABRICATION TECHNIQUE; HIGH INDEX CONTRAST; LATERAL RADIATIONS; LOW-LOSS WAVEGUIDES; PROPAGATION LOSS; SILICON-ON- INSULATORS (SOI); THERMAL OXIDATION;

RIDGE WAVEGUIDES;

EID: 61449242892     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.000958     Document Type: Article

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