Etch-free low loss silicon waveguides using hydrogen silsesquioxane oxidation masks

Optics Express

Volumn 19, Issue 20, 2011, Pages 18827-18832

  Nezhad, Maziar P ^a   Bondarenko, Olesya ^a   Khajavikhan, Mercedeh ^a   Simic, Aleksandar ^a   Fainman, Yeshaiahu ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; OXIDATION;

ETCHING STEP; FABRICATION TECHNIQUE; HYDROGEN SILSESQUIOXANE; LOCAL OXIDATION; LOW LOSS; OXIDATION MASKS; Q-FACTORS; RING RESONATOR; SILICON ON INSULATOR; SILICON WAVEGUIDE; SILICON-ON-INSULATOR MATERIALS; SPECTRAL RESPONSE; WAVEGUIDE LOSS;

WAVEGUIDES;

GLASS; SILICON;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; FIBER OPTICS; INSTRUMENTATION; METHODOLOGY; REFRACTOMETRY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; FIBER OPTIC TECHNOLOGY; GLASS; REFRACTOMETRY; SILICON;

EID: 80053288080     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.018827     Document Type: Article

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