Demonstration of submicron square-like silicon waveguide using optimized LOCOS process

Optics Express

Volumn 18, Issue 18, 2010, Pages 18592-18597

  Desiatov, Boris ^a   Goykhman, Ilya ^a   Levy, Uriel ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; OXIDATION; REFRACTIVE INDEX; SILICON OXIDES;

1550 NM; EFFECTIVE REFRACTIVE INDEX; EXPERIMENTAL CHARACTERIZATION; INFRA-RED CAMERAS; LOCAL OXIDATION; LOCAL OXIDATION OF SILICONS; LOW LOSS; NEAR-FIELD SCANNING OPTICAL MICROSCOPE; SILICON WAVEGUIDE; SUBMICRON; SUBMICRON SCALE; WAVEGUIDE GEOMETRY;

WAVEGUIDES;

OXIDE; SILICON; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; FINITE ELEMENT ANALYSIS; INSTRUMENTATION; LIGHT; METHODOLOGY; MICROSCOPY; OPTICS; RADIATION SCATTERING; REFRACTOMETRY; SCANNING ELECTRON MICROSCOPY; THEORETICAL MODEL;

FINITE ELEMENT ANALYSIS; LIGHT; MICROSCOPY; MICROSCOPY, ELECTRON, SCANNING; MODELS, THEORETICAL; OPTICS AND PHOTONICS; OXIDES; REFRACTOMETRY; SCATTERING, RADIATION; SILICON; SILICON DIOXIDE;

EID: 77956386347     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.018592     Document Type: Article

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