Improving the sensitivity of Raman signal of ZnO thin films deposited on silicon substrate

Vibrational Spectroscopy

Volumn 62, Issue , 2012, Pages 217-221

  Hammouda, A ^a,b,c,d   Canizares A ^a,b   Simon, P ^a,b   Boughalout, A ^c   Kechouane, M ^c  

^a CNRS UPR3079 CEMHTI   (France)

^b UNIVERSITÉ D'ORLÉANS   (France)

^c UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

^d Centre Recherche Scientifique et Technique en Soudage et Controle   (Algeria)

Author keywords

DC reactive sputtering deposition; Raman spectroscopy; Silicon; Thin films; Zinc oxide

Indexed keywords

DC REACTIVE SPUTTERING; RAMAN SELECTION RULES; RAMAN SIGNAL; SILICON SUBSTRATES; THIN-FILM DEPOSITIONS; ZNO; ZNO THIN FILM;

LASER EXCITATION; METALLIC FILMS; MONOCRYSTALLINE SILICON; OPTICAL FILMS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON; THIN FILMS; ZINC OXIDE;

SILICON WAFERS;

EID: 84865616367     PISSN: 09242031     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vibspec.2012.07.004     Document Type: Article

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