Origination of nano- and microstructures on large areas by interference lithography

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 293-296

  Wolf, Andreas J ^a   Hauser, Hubert ^a   Kübler, Volker ^a   Walk, Christian ^a   Höhn, Oliver ^a   Bläsi, Benedikt ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

Display technology; Interference lithography; Nanoimprint lithography; Replication; Solar cells

Indexed keywords

3-DIMENSIONAL; APPLICATION EXAMPLES; CRYSTALLINE SILICON SOLAR CELLS; DISPLAY APPLICATION; DISPLAY TECHNOLOGIES; ETCHING MASKS; ETCHING STEP; INDUSTRIAL FABRICATION; INTERFERENCE LITHOGRAPHY; LIGHT MANAGEMENT; LIGHT TRAPPING STRUCTURES; MASS PRODUCTION; MICRO AND NANOSTRUCTURES; PHOTONIC STRUCTURE; RADIATION POWER MANAGEMENT; REPLICATION; REPLICATION TECHNIQUES; SURFACE RELIEFS; UPSCALING;

ETCHING; NANOIMPRINT LITHOGRAPHY; OPTICAL PROPERTIES; SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 84865579046     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.05.018     Document Type: Conference Paper

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