Nanoimprint lithography for solar cell texturisation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7716, Issue , 2010, Pages

  Hauser, Hubert ^a   Berger, Pauline ^a,c   Michl, Bernhard ^a   Müller, Claas ^b   Schwarzkopf, Sebastian ^a   Hermle, Martin ^a   Bläsi, Benedikt ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b UNIVERSITY OF FREIBURG   (Germany)

^c Sunways AG   (Germany)

Author keywords

Light trapping; Multicrystalline silicon; Nanoimprint lithography; Plasma etching; Solar cell; Texturisation

Indexed keywords

ETCHING MASKS; FOURIER SPECTROSCOPY; FRONT SURFACES; HIGH EFFICIENCY; INDUSTRIAL PRODUCTION; INDUSTRIAL SCALE; INTERFERENCE LITHOGRAPHY; LABORATORY SCALE; LIGHT-TRAPPING; MASK LESS; MULTI-CRYSTALLINE SILICON; PHOTOLITHOGRAPHIC PROCESS; POTENTIAL TECHNOLOGIES; PROCESS CHAIN; PROCESS COMPLEXITY; TEXTURED SURFACE; TEXTURISATION; UV-NANOIMPRINT LITHOGRAPHY;

CRYSTAL ORIENTATION; LIGHT; PHOTOLITHOGRAPHY; PLASMA ETCHING; POLYSILICON; SILICON WAFERS; SOLAR CELLS; TEXTURES;

NANOIMPRINT LITHOGRAPHY;

EID: 79251587244     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.853897     Document Type: Conference Paper

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