Nanoimprint Lithography for honeycomb texturing of multicrystalline silicon

Energy Procedia

Volumn 8, Issue , 2011, Pages 648-653

  Hauser, H ^a   Michl, B ^a   Kubler V ^a   Schwarzkopf, S ^a   Muller C ^b   Hermle, M ^a   Blasi B ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Honeycomb texture; Light trapping; Multicrystalline silicon; Nanoimprint lithography; Plasma etching

Indexed keywords

CHAINS; CHARACTERIZATION; CURING; HONEYCOMB STRUCTURES; LITHOGRAPHY; MONOCRYSTALLINE SILICON; OPTICAL PROPERTIES; PLASMA ETCHING; POLYSILICON; SILICON; SILICONES; SUBSTRATES;

EMITTER SATURATION CURRENT DENSITY; INTERFERENCE LITHOGRAPHY; LIGHT-TRAPPING; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON (MC-SI); PLASMA INDUCED DAMAGE; REFLECTION MEASUREMENTS; TEXTURED SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 80052079385     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.06.196     Document Type: Conference Paper

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