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Volumn 52, Issue 4, 2012, Pages 765-773
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Effects of Ti-doped concentration on the microstructures and optical properties of ZnO thin films
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Author keywords
Optical properties; RF magnetron sputtering; X ray diffraction; ZnO:Ti thin films
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Indexed keywords
BLUE SHIFT;
CRYSTALLINE STRUCTURE;
DIFFRACTION PEAKS;
EMISSION PEAKS;
FLUORESCENCE SPECTROPHOTOMETER;
GLASS SUBSTRATES;
HEXAGONAL WURTZITE;
PHOTOLUMINESCENCE SPECTRUM;
PREFERENTIAL ORIENTATION;
PURE ZNO;
RADIO FREQUENCIES;
REACTIVE MAGNETRON SPUTTERING;
RF-MAGNETRON SPUTTERING;
ROOM TEMPERATURE;
SCANNING ELECTRONIC MICROSCOPY;
SMOOTH SURFACE;
TI ATOMS;
TI CONTENT;
TI DOPING;
VISIBLE WAVELENGTHS;
XRD MEASUREMENTS;
ZNO;
ZNO THIN FILM;
MAGNETRON SPUTTERING;
METALLIC FILMS;
OPTICAL PROPERTIES;
PHOTOLUMINESCENCE;
SUBSTRATES;
THIN FILMS;
TITANIUM;
X RAY DIFFRACTION;
ZINC OXIDE;
ZINC SULFIDE;
SEMICONDUCTOR DOPING;
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EID: 84864807829
PISSN: 07496036
EISSN: 10963677
Source Type: Journal
DOI: 10.1016/j.spmi.2012.06.021 Document Type: Article |
Times cited : (56)
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References (30)
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