SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 15, 2011, Pages 5106-5109

Structural and optical properties of Ti-doped ZnO thin films prepared by the cathodic vacuum arc technique with different annealing processes

(3) Wu, Chun Sen a Lin, Bor Tsuen b Yang, Ru Yuan c

a METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE (Taiwan)

b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES (Taiwan)

c NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Cathodic vacuum arc technique; TCO; Zinc oxide

Indexed keywords

AMORPHOUS PHASE; ANNEALING PROCESS; AS-DEPOSITED FILMS; CATHODIC VACUUM ARC TECHNIQUE; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; MIXED GAS; OPTICAL QUALITIES; OPTICAL TRANSMITTANCE; POST ANNEALING; STRUCTURAL AND OPTICAL PROPERTIES; TARGET POWER; TCO; TRANSMITTANCE MEASUREMENTS; X-RAY DIFFRACTION MEASUREMENTS; ZNO THIN FILM;

AMORPHOUS FILMS; ANNEALING; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; THIN FILMS; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 79957647871 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.153 Document Type: Conference Paper

Times cited : (8)

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