Fabrication of high-resolution large-area patterns using EUV interference lithography in a scan-exposure mode

Nanotechnology

Volumn 23, Issue 30, 2012, Pages

  Wang, L ^a   Solak, H H ^c   Ekinci, Y ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

^c EULITHA AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COST-EFFECTIVE METHODS; HIGH RESOLUTION; INTERFERENCE LITHOGRAPHY; LIMITED BEAMS; PERIODIC NANOSTRUCTURE;

NANOSTRUCTURED MATERIALS;

NANOTECHNOLOGY;

EID: 84863686132     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/30/305303     Document Type: Article

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