Nanometer-accurate grating fabrication with scanning beam interference lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4936, Issue , 2002, Pages 126-134

  Chen, Carl G ^a   Konkola, Paul T ^a   Heilmann, Ralf K ^a   Joo, Chulmin ^a   Schattenburg, Mark L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Displacement Measuring Interferometry; Fringe Locking; Grating; Interference Lithography; Metrology; Phase Shifting Interferometry; SBIL; Scanning Beam Interference Lithography

Indexed keywords

DIFFRACTION GRATINGS; INTERFEROMETRY; PATTERN MATCHING; PHASE SHIFT; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

FRINGE LOCKING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0038079310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.469431     Document Type: Conference Paper

References (18)

1. J. Ferrera, Nanometer-Scale Placement in Electron-Beam Lithography. PhD dissertation, Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, June 2000.
2. K. Hibinio and Z. Hegedus, "Hyperbolic holographic gratings: analysis and interferometric tests," Applied Optics 33, pp. 2553-2559, May 1994.
3. J. Ferrera, M. Schattenburg, and H. Smith, "Analysis of distortion in interferometric lithography," J. Vac. Sci. Technol. B 14, pp. 4009-4013, Nov.-Dec. 1996.
4. C. G. Chen, Microcomb Fabrication for High Accuracy Foil X-ray Telescope Assembly and Vector Gaussian Beam Modeling. Master's thesis, Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, June 2000.
5. C. G. Chen, P. T. Konkola, R. K. Heilmann, G. S. Pati, and M. L. Schattenburg, "Image metrology and system controls for scanning beam interference lithography," J. Vac. Sci. Technol. B 19, pp. 2335-2341, Nov.-Dec. 2001.
6. M. L. Schattenburg, C. Chen, P. N. Everett, J. Ferrera, P. Konkola, and H. I. Smith, "Sub-100nm metrology using interferometrically produced fiducials," J. Vac. Sci. Technol. B 17, pp. 2692-2697, Nov.-Dec. 1999.
7. P. T. Konkola, C. G. Chen, R. K. Heilmann, G. S. Pati, and M. L. Schattenburg, "Scanning beam interference lithography," Proceedings of ASPE, Nov. 2001.
8. M. L. Schattenburg and H. I. Smith, "The critical role of metrology in nanotechnology," Proc. SPIE 4608, pp. 116-124, 2001.
9. N. Bobroff, "Recent advances in displacement measuring interferometry," Meas. Sci. Technol. 4, pp. 907-926, 1993.
10. F. C. Demarest, "High-resolution, high-speed, low data age uncertainty, heterodyne displacement measuring interferometer electronics," Meas. Sci. Technol. 9, pp. 1024-1030, 1998.
11. R. K. Heilmann, P. T. Konkola, C. G. Chen, G. S. Pati, and M. L. Schattenburg, "Digital heterodyne interference fringe control system," J. Vac. Sci. Technol. B 19, pp. 2342-2346, Nov.-Dec. 2001.
12. P. T. Konkola, C. G. Chen, R. K. Heilmann, and M. L. Schattenburg, "Beam steering system and spatial filtering applied to interference lithography," J. Vac. Sci. Technol. B 18, pp. 3282-3286, Nov.-Dec. 2000.
13. C. J. Evans, R. J. Hocken, and W. T. Estler, "Self-calibration: reversal, redundancy, error separation, and "absolute testing"," CIRP Annals 45(2), pp. 617-634, 1996.
14. C. Joo, C. G. Chen, P. T. Konkola, R. K. Heilmann, G. S. Pati, and M. L. Schattenburg, "Nanometeraccurate fringe metrology using a Fresnel zone plate," to be published in J. Vac. Sci. Technol. B, Nov.-Dec. 2002.
15. C. G. Chen, R. K. Heilmann, C. Joo, P. T. Konkola, G. S. Pati, and M. L. Schattenburg, "Beam alignment for scanning beam interference lithography," to be published in J. Vac. Sci. Technol. B, Nov.-Dec. 2002.
16. D. Malacara, Ed., Optical Shop Testing, Wiley, 2nd ed., 1992.
17. P. Hariharan, B. F. Oreb, and T. Eiju, "Digital phase-shifting interferometry: A simple error-compensating phase calculation algorithm," Applied Optics 26, p. 2504ff, 1987.
18. C. G. Chen, P. T. Konkola, J. Ferrera, R. K. Heilmann, and M. L. Schattenburg, "Analyses of vector Gaussian beam propagation and the validity of paraxial and spherical approximations," J. Opt. Soc. Am. A 19(2), pp. 404-412, 2002.