A new nanoporous material based on amorphous silicon dioxide

Bulletin of the Russian Academy of Sciences: Physics

Volumn 76, Issue 5, 2012, Pages 582-587

  Vlasukova, L A ^a   Komarov, F F ^a   Yuvchenko, V N ^a   Mil'chanin, O V ^a   Didyk, A Yu ^b   Skuratov, V A ^b   Kislitsyn, S B ^c  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^c INSTITUTE OF NUCLEAR PHYSICS   (Kazakhstan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; CHEMICAL TREATMENTS; FAST IONS; LENGTH TO DIAMETER RATIO; NANO-POROUS; NANOPOROUS MATERIALS; THERMAL SPIKE MODEL; THERMALLY OXIDIZED SILICON;

HYDROFLUORIC ACID; IRRADIATION; POROUS MATERIALS; SILICA; SILICON; SILICON OXIDES; VAPORS;

SILICON WAFERS;

EID: 84863646877     PISSN: 10628738     EISSN: None     Source Type: Journal    
DOI: 10.3103/S1062873812050267     Document Type: Conference Paper

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