Ion tracks in amorphous SiO2 irradiated with low and high energy heavy ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 245, Issue 1, 2006, Pages 269-273

  Jensen, J ^a   Razpet, A ^b   Skupinski M ^a   Possnert, G ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Defects; Ion tracks; Nano pores; Silicon dioxide

Indexed keywords

AMORPHOUS SILICON; DEFECTS; ETCHING; HEAVY IONS; ION BOMBARDMENT;

ETCHING THRESHOLD; ION TRACKS; NANO-PORES;

SILICA;

EID: 33344473813     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.11.072     Document Type: Conference Paper

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