Processing of nano-holes and pores on SiO2 thin films by MeV heavy ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 486-489

  Milanez Silva, C ^a   Varisco, P ^a   Moehlecke, A ^a   Fichtner, P P ^b   Papaleo R M ^a   Eriksson, J ^c  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c SWEDISH UNIVERSITY OF AGRICULTURAL SCIENCES   (Sweden)

Author keywords

Ion tracks; Nano pores; Silicon dioxide

Indexed keywords

ETCHING; HEAVY IONS; ION BOMBARDMENT; POROUS MATERIALS; SILICA; SOLUTIONS; TRANSMISSION ELECTRON MICROSCOPY;

ION TRACKS;

THIN FILMS;

EID: 0038075202     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00803-6     Document Type: Conference Paper

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