Etched track morphology in SiO2 irradiated with swift heavy ions

Lithuanian Journal of Physics

Volumn 49, Issue 1, 2009, Pages 111-115

  Komarov, F E ^a,d   Vlasukova, L A ^a,d   Kuchinskyi, P V ^a,d   Didyk, A Yu ^b,e   Skuratov, V A ^b,e   Voronova, N A ^c,f  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^c AL FARABI KAZAKH NATIONAL UNIVERSITY   (Kazakhstan)

^d Baltarusijos Valstybinis Universitetas ^*  (Belarus)

^e Jungtinio Branduoliniu Tyrimu Instituto Branduoliniu   (Russian Federation)

^f Al Farabi Kazachijos Nacionalinis Universitetas   (Kazakhstan)

Author keywords

Latent track etching; SEM; Silicon dioxide; Swift ion irradiation

Indexed keywords

EID: 77950449306     PISSN: 16488504     EISSN: None     Source Type: Journal    
DOI: 10.3952/lithjphys.49113     Document Type: Conference Paper

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