Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate

Applied Surface Science

Volumn 258, Issue 22, 2012, Pages 8819-8824

  Besleaga, C ^a   Stan, G E ^b   Galca, A C ^b   Ion, L ^a   Antohe, S ^a  

^a UNIVERSITY OF BUCHAREST   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Interface; Magnetron sputtering; VRH mechanism; XRR; ZnO thin films

Indexed keywords

CRYSTALLOGRAPHY; GLASS; II-VI SEMICONDUCTORS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TEMPERATURE DISTRIBUTION; X RAY DIFFRACTION; ZINC OXIDE;

DOUBLE LAYER STRUCTURE; ELECTRICAL MEASUREMENT; MOTT VARIABLE-RANGE HOPPING; NANO-SIZED CRYSTALLITES; PSEUDO-VOIGT FUNCTIONS; RF-MAGNETRON SPUTTERING; TEMPERATURE DEPENDENCE; ZNO THIN FILM;

THIN FILMS;

EID: 84863505888     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.05.097     Document Type: Article

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