Some physical properties of ZnO thin films prepared by RF sputtering technique

International Journal of Hydrogen Energy

Volumn 34, Issue 12, 2009, Pages 5218-5222

  Ekem, N ^a   Korkmaz, S ^a   Pat, S ^a   Balbag, M Z ^a   Cetin, E N ^a   Ozmumcu, M ^a  

^a ESKISEHIR OSMANGAZI UNIVERSITY   (Turkey)

Author keywords

Optical properties; RF sputter; Thin film; ZnO

Indexed keywords

AFM IMAGE; ELECTRICAL CONDUCTIVITY; GAS-MIXING; OPTICAL METHODS; OXIDATION PROCESS; REFRACTIVE INDEX AND BAND GAP; RF SPUTTER; RF-SPUTTERING; ZNO; ZNO THIN FILM;

ELECTRIC CONDUCTIVITY; METALLIC FILMS; OPTICAL FILMS; REFRACTIVE INDEX; SEMICONDUCTING ZINC COMPOUNDS; THIN FILM DEVICES; ZINC; ZINC OXIDE;

THIN FILMS;

EID: 67349206914     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijhydene.2009.02.001     Document Type: Article

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