Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application

Journal of Applied Physics

Volumn 111, Issue 4, 2012, Pages

  Hong, Lei ^a   Wang, Xincai ^b   Rusli, ^a   Wang, Hao ^a   Zheng, Hongyu ^b   Yu, Hongyu ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^c SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMORPHOUS SILICON (A-SI); FILM QUALITY; LIGHT-TRAPPING; ND:YVO4; NEAR INFRARED; ONE-STEP ANNEALING; PHOTOVOLTAIC APPLICATIONS; PULSE ENERGIES; REPETITION RATE; SCANNING SPECTROPHOTOMETERS; SEQUENTIAL LATERAL SOLIDIFICATIONS; SI SOLAR CELLS; SURFACE-TEXTURING; UV LASERS; UV-VISIBLE;

AMORPHOUS FILMS; DOMES; NEODYMIUM; SILICON;

AMORPHOUS SILICON;

EID: 84863273935     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3686612     Document Type: Article

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