Laser crystallization of silicon for high-performance thin-film transistors

Semiconductor Science and Technology

Volumn 15, Issue 10, 2000, Pages

  Dassow, R ^a   Kohler J R ^a   Helen, Y ^b   Mourgues, K ^b   Bonnaud, O ^b   Mohammed Brahim, T ^b   Werner, J H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTALLIZATION; EXCIMER LASERS; FIELD EFFECT SEMICONDUCTOR DEVICES; LASER APPLICATIONS; LASER PULSES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SOLIDIFICATION; THIN FILM TRANSISTORS;

LASER CRYSTALLIZATION;

SEMICONDUCTING SILICON;

EID: 0342573173     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/10/101     Document Type: Article

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