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Journal of the Electrochemical Society

Volumn 159, Issue 4, 2012, Pages

Tunable electrical and optical properties in composition controlled Hf:ZnO thin films grown by atomic layer deposition

(3) Ahn, Cheol Hyoun a Kim, Jae Hyun b Cho, Hyung Koun a

a Sungkyunkwan University (South Korea)

b Daegu Gyeongbuk Institute of Science and Technology (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BAND EDGE; BAND GAPS; BURSTEIN-MOSS EFFECTS; CRYSTALLINITIES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; HIGH-ELECTRON-DENSITY; POLYCRYSTALLINE THIN FILM; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE REGION; ZNO MATRIX;

ATOMIC LAYER DEPOSITION; ELECTRIC CONDUCTIVITY; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; PHASE SEPARATION; SEMICONDUCTOR QUANTUM WELLS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

HAFNIUM;

EID: 84863171064 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/2.026204jes Document Type: Article

Times cited : (49)

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